(AlCrTaTiZr)N/(AlCrTaTiZr)N0.7 bilayer structure of high resistance to the interdiffusion of Cu and Si at 900°C

MLA

Chang, Shou-Yi, and Dao-Sheng Chen. “(AlCrTaTiZr)N/(AlCrTaTiZr)N0.7 Bilayer Structure of High Resistance to the Interdiffusion of Cu and Si at 900°C.” Materials Chemistry & Physics, vol. 125, no. 1/2, Jan. 2011, pp. 5–8. EBSCOhost, https://doi.org/10.1016/j.matchemphys.2010.09.016.

APA

Chang, S.-Y., & Chen, D.-S. (2011). (AlCrTaTiZr)N/(AlCrTaTiZr)N0.7 bilayer structure of high resistance to the interdiffusion of Cu and Si at 900°C. Materials Chemistry & Physics, 125(1/2), 5–8. https://doi.org/10.1016/j.matchemphys.2010.09.016

Chicago

Chang, Shou-Yi, and Dao-Sheng Chen. 2011. “(AlCrTaTiZr)N/(AlCrTaTiZr)N0.7 Bilayer Structure of High Resistance to the Interdiffusion of Cu and Si at 900°C.” Materials Chemistry & Physics 125 (1/2): 5–8. doi:10.1016/j.matchemphys.2010.09.016.