Photoemission Studies of Metallic Photocathodes Prepared by Pulsed Laser Ablation Deposition Technique.

We present the results of our investigation on metallic films as suitable photocathodes for the production of intense electron beams in RF photoinjector guns. Pulsed laser ablation deposition technique was used for growing Mg and Y thin films onto Si and Cu substrates in high vacuum and at room temperature. Different diagnostic methods were used to characterize the thin films deposited on Si with the aim to optimize the deposition process. Photoelectron performances were investigated on samples deposited on Cu substrate in an ultra high vacuum photodiode chamber at 10-7 Pa. Relatively high quantum efficiencies have been obtained for the deposited films, comparable to those of corresponding bulks. Samples could stay for several months in humid open air before being tested in a photodiode cell. The deposition process and the role of the photocathode surface contamination and its influence on the photoelectron performances are presented and discussed. [ABSTRACT FROM AUTHOR]