Cite
A Comparative Study Of Dopant Activation And Deactivation In Arsenic and Phosphorus Implanted Silicon.
MLA
Qin, S., et al. “A Comparative Study Of Dopant Activation And Deactivation In Arsenic and Phosphorus Implanted Silicon.” AIP Conference Proceedings, vol. 1321, no. 1, Jan. 2011, pp. 188–91. EBSCOhost, https://doi.org/10.1063/1.3548344.
APA
Qin, S., McTeer, A., Hu, J. Y., Prussin, S., & Reyes, J. (2011). A Comparative Study Of Dopant Activation And Deactivation In Arsenic and Phosphorus Implanted Silicon. AIP Conference Proceedings, 1321(1), 188–191. https://doi.org/10.1063/1.3548344
Chicago
Qin, S., Allen McTeer, Jeff Y. Hu, S. Prussin, and Jason Reyes. 2011. “A Comparative Study Of Dopant Activation And Deactivation In Arsenic and Phosphorus Implanted Silicon.” AIP Conference Proceedings 1321 (1): 188–91. doi:10.1063/1.3548344.