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Nanostructured MoS x -based thin films obtained by electrochemical reduction

Authors :
Ghosh, S.K.
Bera, T.
Karacasu, O.
Swarnakar, A.
Buijnsters, J.G.
Celis, J.P.
Source :
Electrochimica Acta. Feb2011, Vol. 56 Issue 5, p2433-2442. 10p.
Publication Year :
2011

Abstract

Abstract: The in situ electrochemical deposition of nanostructured MoS x (x =1.5–1.7) based thin films on various substrates from aqueous solutions is reported. The as-deposited amorphous films transform on annealing into crystalline ones as revealed by a stepwise high temperature X-ray diffraction (XRD). Both Raman spectroscopy and XRD crystal structure analyses confirmed the formation of inorganic fullerene-MoS x nanoparticles (IF-MoS x ). The as-deposited thin films have a featureless surface morphology, but after annealing either a nanotube or a nanorod structure along with numerous smaller nanoballs appear at the surface. An investigation by transmission electron microscopy unearths the presence of nanoballs, nanoribbons, and nanotubes throughout the annealed MoS x thin films. The size of the nanoballs is in the range of 5–10nm. The nanotubes have a diameter of 10–400nm, and a length of up to several micrometers as evidenced by SEM. The catalytic effect of transition metals on the growth of nanotubes is noticed. The temperature-induced transformation from amorphous to crystalline structured MoS x films results in a large lowering of the coefficient of friction under sliding against corundum in ambient air of 50% relative humidity. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00134686
Volume :
56
Issue :
5
Database :
Academic Search Index
Journal :
Electrochimica Acta
Publication Type :
Academic Journal
Accession number :
57683392
Full Text :
https://doi.org/10.1016/j.electacta.2010.10.065