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High-speed and low-voltage performance in a charge-trapping flash memory using a NiO tunnel junction.
- Source :
-
Journal of Physics D: Applied Physics . Apr2011, Vol. 44 Issue 15, p155105-155105. 1p. - Publication Year :
- 2011
-
Abstract
- A novel charge-trapping nonvolatile memory using gate injection switching is demonstrated in this paper. This device is composed of metal/NiO/nitride/oxide/silicon in order to make use of the electrical transport phenomenon found in NiO tunnel junctions. Compared with the reference structure of a conventional metal/oxide/nitride/oxide/silicon memory, the proposed device showed a larger memory window, very fast switching speeds of 100 ns/1 us and a low operation voltage of +-5 V for the program/erase states. In addition, we observed that a large number of interface states in the bottom oxide were reduced using deep-level transient spectroscopy. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00223727
- Volume :
- 44
- Issue :
- 15
- Database :
- Academic Search Index
- Journal :
- Journal of Physics D: Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 59859313
- Full Text :
- https://doi.org/10.1088/0022-3727/44/15/155105