Cite
In situ real-time study of chemical etching process of Si(100) using light scattering.
MLA
Zhao, Y. P., et al. “In Situ Real-Time Study of Chemical Etching Process of Si(100) Using Light Scattering.” Applied Physics Letters, vol. 69, no. 2, July 1996, p. 221. EBSCOhost, https://doi.org/10.1063/1.117378.
APA
Zhao, Y.-P., Wu, Y.-J., Yang, H.-N., Wang, G.-C., & Lu, T.-M. (1996). In situ real-time study of chemical etching process of Si(100) using light scattering. Applied Physics Letters, 69(2), 221. https://doi.org/10.1063/1.117378
Chicago
Zhao, Y.-P., Y.-J. Wu, H.-N. Yang, G.-C. Wang, and T.-M. Lu. 1996. “In Situ Real-Time Study of Chemical Etching Process of Si(100) Using Light Scattering.” Applied Physics Letters 69 (2): 221. doi:10.1063/1.117378.