Cite
Using APCS for Plasma Vertical Control at TCV.
MLA
Cruz, N., et al. “Using APCS for Plasma Vertical Control at TCV.” IEEE Transactions on Nuclear Science, vol. 58, no. 4, Aug. 2011, pp. 1570–75. EBSCOhost, https://doi.org/10.1109/TNS.2011.2160203.
APA
Cruz, N., Moret, J.-M., Coda, S., Paley, J. I., Duval, B. P., Rodrigues, A. P., Piras, F., Felici, F., Correia, C. M. B. A., & Varandas, C. A. F. (2011). Using APCS for Plasma Vertical Control at TCV. IEEE Transactions on Nuclear Science, 58(4), 1570–1575. https://doi.org/10.1109/TNS.2011.2160203
Chicago
Cruz, N., J.-M. Moret, S. Coda, J. I. Paley, B. P. Duval, A. P. Rodrigues, F. Piras, F. Felici, C. M. B. A. Correia, and C. A. F. Varandas. 2011. “Using APCS for Plasma Vertical Control at TCV.” IEEE Transactions on Nuclear Science 58 (4): 1570–75. doi:10.1109/TNS.2011.2160203.