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Electron-beam activated thermal sputtering of thermoelectric materials.

Authors :
Wu, Jinsong
He, Jiaqing
Han, Mi-Kyung
Sootsman, Joseph R.
Girard, Steven
Arachchige, Indika U.
Kanatzidis, Mercouri G.
Dravid, Vinayak P.
Source :
Journal of Applied Physics. Aug2011, Vol. 110 Issue 4, p044325. 6p.
Publication Year :
2011

Abstract

Thermoelectricity and Seebeck effect have long been observed and validated in bulk materials. With the development of advanced tools of materials characterization, here we report the first observation of such an effect in the nanometer scale: in situ directional sputtering of several thermoelectric materials inside electron microscopes. The temperature gradient introduced by the electron beam creates a voltage-drop across the samples, which enhances spontaneous sputtering of specimen ions. The sputtering occurs along a preferential direction determined by the direction of the temperature gradient. A large number of nanoparticles form and accumulate away from the beam location as a result. The sputtering and re-crystallization are found to occur at temperatures far below the melting points of bulk materials. The sputtering occurs even when a liquid nitrogen cooling holder is used to keep the overall temperature at -170 °C. This unique phenomenon that occurred in the nanometer scale may provide useful clues to understanding the mechanism of thermoelectric effect. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
110
Issue :
4
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
65108545
Full Text :
https://doi.org/10.1063/1.3624755