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Paraffin wax passivation layer improvements in electrical characteristics of bottom gate amorphous indium–gallium–zinc oxide thin-film transistors

Authors :
Chang, Geng-Wei
Chang, Ting-Chang
Syu, Yong-En
Tsai, Tsung-Ming
Chang, Kuan-Chang
Tu, Chun-Hao
Jian, Fu-Yen
Hung, Ya-Chi
Tai, Ya-Hsiang
Source :
Thin Solid Films. Dec2011, Vol. 520 Issue 5, p1608-1611. 4p.
Publication Year :
2011

Abstract

Abstract: In this research, paraffin wax is employed as the passivation layer of the bottom gate amorphous indium–gallium–zinc oxide thin-film transistors (a-IGZO TFTs), and it is formed by sol–gel process in the atmosphere. The high yield and low cost passivation layer of sol–gel process technology has attracted much attention for current flat-panel-display manufacturing. Comparing with passivation-free a-IGZO TFTs, passivated devices exhibit a superior stability against positive gate bias stress in different ambient gas, demonstrating that paraffin wax shows gas-resisting characteristics for a-IGZO TFTs application. Furthermore, light-induced stretch-out phenomenon for paraffin wax passivated device is suppressed. This superior stability of the passivated device was attributed to the reduced total density of states (DOS) including the interfacial and semiconductor bulk trap densities. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00406090
Volume :
520
Issue :
5
Database :
Academic Search Index
Journal :
Thin Solid Films
Publication Type :
Academic Journal
Accession number :
69628042
Full Text :
https://doi.org/10.1016/j.tsf.2011.08.104