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Ferroelectric properties of vanadium-doped Bi[sub 4]Ti[sub 3]O[sub 12] thin films deposited by a sol–gel method.

Authors :
Kim, S. S.
Song, T. K.
Kim, J. K.
Kim, Jinheung
Source :
Journal of Applied Physics. 8/15/2002, Vol. 92 Issue 4, p2213. 3p. 5 Graphs.
Publication Year :
2002

Abstract

We report the enhancement of ferroelectric properties in vanadium-doped Bi[sub 4]Ti[sub 3]O[sub 12] (BIT) thin films deposited by a sol-gel method. Compared to the undoped BIT, V-doped BIT (BTV) showed higher polarizations and a better fatigue resistance as reported in ceramic systems recently [Noguchi et al., Appl. Phys. Lett. 78, 1903 (2001)]. BTV showed a remanent polarization (2P[sub r]) of 15.9 µC/cm², higher than the value for BIT, 12.5 µC/cm². The polarization of the BTV thin film capacitor decreased by 19%, while that of the BIT decreased by 23% after the fatigue test with 4 × 10[sup 10] switching cycles. [ABSTRACT FROM AUTHOR]

Subjects

Subjects :
*FERROELECTRICITY
*VANADIUM

Details

Language :
English
ISSN :
00218979
Volume :
92
Issue :
4
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7066728
Full Text :
https://doi.org/10.1063/1.1494840