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Process-induced mechanical stress in isolation structures studied by micro-Raman spectroscopy.

Authors :
De Wolf, I.
Norström, H.
Maes, H. E.
Source :
Journal of Applied Physics. 10/1/1993, Vol. 74 Issue 7, p4490. 11p. 1 Black and White Photograph, 1 Diagram, 1 Chart, 13 Graphs.
Publication Year :
1993

Abstract

Focuses on a study of process-induced mechanical stress in isolation structures by means of micro-Raman spectroscopy. Methods used for the preparation of the poly-buffered local oxidation of silicon samples; Optical Raman modes of crystalline silicon; Analysis of stress due to the silicon nitride mask.

Details

Language :
English
ISSN :
00218979
Volume :
74
Issue :
7
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7621318
Full Text :
https://doi.org/10.1063/1.354365