Cite
Control of powder formation in silane discharge by cathode heating and hydrogen dilution for high-rate deposition of hydrogenated amorphous silicon thin films.
MLA
Banerjee, Ratnabali, et al. “Control of Powder Formation in Silane Discharge by Cathode Heating and Hydrogen Dilution for High-Rate Deposition of Hydrogenated Amorphous Silicon Thin Films.” Journal of Applied Physics, vol. 74, no. 7, Oct. 1993, p. 4540. EBSCOhost, https://doi.org/10.1063/1.354371.
APA
Banerjee, R., Sharma, S. N., Chattopadhyay, S., Batabyal, A. K., & Barua, A. K. (1993). Control of powder formation in silane discharge by cathode heating and hydrogen dilution for high-rate deposition of hydrogenated amorphous silicon thin films. Journal of Applied Physics, 74(7), 4540. https://doi.org/10.1063/1.354371
Chicago
Banerjee, Ratnabali, S. N. Sharma, S. Chattopadhyay, A. K. Batabyal, and A. K. Barua. 1993. “Control of Powder Formation in Silane Discharge by Cathode Heating and Hydrogen Dilution for High-Rate Deposition of Hydrogenated Amorphous Silicon Thin Films.” Journal of Applied Physics 74 (7): 4540. doi:10.1063/1.354371.