Mass and energy dependence of implanted ion profiles in the AZ111 photoresist.

Authors :: Guimarães, R. B.
Behar, M.
Livi, R. P.
de Souza, J. P.
Zawislak, F. C.
Fink, D.
Biersack, J. P.
Source :: Journal of Applied Physics. 8/15/1986, Vol. 60 Issue 4, p1322. 3p. 1 Chart, 3 Graphs.
Publication Year :: 1986
Abstract: Presents information on a study that compared the profiles of bismuth, xenon, tin, krypton, gallium, iron, potassium, argon, phosphorus, sodium and fluorine implanted into the AZ111 photoresist with theoretical predictions. Experimental procedure; Results and discussion.

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