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Low-temperature reaction of thin-film platinum (≤300 Å) with (100) silicon.
- Source :
-
Journal of Applied Physics . 12/15/1990, Vol. 68 Issue 12, p6246. 7p. - Publication Year :
- 1990
-
Abstract
- Presents a study that investigated low-termperature reaction of thin-film platinum with silicon. Sheet resistance measurement of silicide formation sequence; Use nitrogen furnace; X-ray diffraction analysis.
- Subjects :
- *THIN films
*PLATINUM
*SILICON
*X-ray diffraction
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 68
- Issue :
- 12
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7627912
- Full Text :
- https://doi.org/10.1063/1.346890