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Liquid source metalorganic chemical vapor deposition of aluminum from triethylamine alane.
- Source :
-
Journal of Applied Physics . 2/15/1991, Vol. 69 Issue 4, p2589. 4p. 2 Black and White Photographs, 1 Chart. - Publication Year :
- 1991
-
Abstract
- Reports on a low-pressure metalorganic chemical vapor deposition of aluminum using triethylamine alane. Function of the liquid source; Activators for nucleation of aluminum; Electrical resistivities of the aluminum films on titanium-nitrogen.
- Subjects :
- *ORGANOMETALLIC compounds
*CHEMICAL vapor deposition
*ALUMINUM films
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 69
- Issue :
- 4
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7629253
- Full Text :
- https://doi.org/10.1063/1.348649