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Fluorine-containing species on the hydrofluoric acid etched silicon single-crystal surface.
- Source :
-
Journal of Applied Physics . 1/15/1991, Vol. 69 Issue 2, p803. 5p. 9 Graphs. - Publication Year :
- 1991
-
Abstract
- Examines the chemical structure and property of fluorine-containing species on the hydrofluoric acid (HF) etched silicon surface. Oxidation rate of HF etched silicon surface; Flourine content on HF etched silicon surface; Chemical reactivity of fluorine-containing species.
- Subjects :
- *FLUORINE
*HYDROFLUORIC acid
*SILICON
*OXIDATION
*CHEMICAL reactions
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 69
- Issue :
- 2
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7630642
- Full Text :
- https://doi.org/10.1063/1.347367