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Fluorine-containing species on the hydrofluoric acid etched silicon single-crystal surface.

Authors :
Takahagi, T.
Ishitani, A.
Kuroda, H.
Nagasawa, Y.
Source :
Journal of Applied Physics. 1/15/1991, Vol. 69 Issue 2, p803. 5p. 9 Graphs.
Publication Year :
1991

Abstract

Examines the chemical structure and property of fluorine-containing species on the hydrofluoric acid (HF) etched silicon surface. Oxidation rate of HF etched silicon surface; Flourine content on HF etched silicon surface; Chemical reactivity of fluorine-containing species.

Details

Language :
English
ISSN :
00218979
Volume :
69
Issue :
2
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7630642
Full Text :
https://doi.org/10.1063/1.347367