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Observation of natural oxide growth on silicon facets using an atomic force microscope with current measurement.

Authors :
Hosaka, Sumio
Koyanagi, Hajime
Hasegawa, Tsuyoshi
Hosoki, Shigeyuki
Hiraiwa, Atsushi
Source :
Journal of Applied Physics. 7/15/1992, Vol. 72 Issue 2, p688. 4p. 2 Black and White Photographs, 2 Graphs.
Publication Year :
1992

Abstract

Presents a study which investigated natural oxide growth on silicon facets using an atomic force microscope with current measurement. Experimental details; Results and discussion; Conclusion.

Subjects

Subjects :
*OXIDES
*EPITAXY
*SILICON

Details

Language :
English
ISSN :
00218979
Volume :
72
Issue :
2
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7632235
Full Text :
https://doi.org/10.1063/1.351854