Back to Search Start Over

Characterization of highly Sb-doped Si using high-resolution x-ray diffraction and transmission electron microscopy.

Authors :
Radamson, H. H.
Sardela, M. R.
Hultman, L.
Hansson, G. V.
Source :
Journal of Applied Physics. 7/15/1994, Vol. 76 Issue 2, p763. 5p.
Publication Year :
1994

Abstract

Reports on the use of two-dimensional reciprocal space mapping with high-resolution x-ray diffraction to characterize the strain in as-grown and annealed antimony-doped silicon (Si). Preparation of the samples; Data on the strain perpendicular to the surface in Si films measured from the maps.

Details

Language :
English
ISSN :
00218979
Volume :
76
Issue :
2
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7632656
Full Text :
https://doi.org/10.1063/1.357778