Back to Search
Start Over
Characterization of highly Sb-doped Si using high-resolution x-ray diffraction and transmission electron microscopy.
- Source :
-
Journal of Applied Physics . 7/15/1994, Vol. 76 Issue 2, p763. 5p. - Publication Year :
- 1994
-
Abstract
- Reports on the use of two-dimensional reciprocal space mapping with high-resolution x-ray diffraction to characterize the strain in as-grown and annealed antimony-doped silicon (Si). Preparation of the samples; Data on the strain perpendicular to the surface in Si films measured from the maps.
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 76
- Issue :
- 2
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7632656
- Full Text :
- https://doi.org/10.1063/1.357778