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Phase formation in the interfacial reactions of ultrahigh vacuum deposited titanium thin films on (111)Si.
- Source :
-
Journal of Applied Physics . 6/15/1992, Vol. 71 Issue 12, p5918. 8p. 5 Black and White Photographs, 1 Diagram, 1 Chart, 2 Graphs. - Publication Year :
- 1992
-
Abstract
- Provides information on a study that examined phase formation in the interfacial reactions of ultrahigh vacuum deposited titanium thin films on (111)silicon by in situ reflected high energy electron diffraction and transmission electron microscopy. Methodology of the study; Results and discussion on the study.
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 71
- Issue :
- 12
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7633566
- Full Text :
- https://doi.org/10.1063/1.350441