Back to Search Start Over

Phase formation in the interfacial reactions of ultrahigh vacuum deposited titanium thin films on (111)Si.

Authors :
Wang, M. H.
Chen, L. J.
Source :
Journal of Applied Physics. 6/15/1992, Vol. 71 Issue 12, p5918. 8p. 5 Black and White Photographs, 1 Diagram, 1 Chart, 2 Graphs.
Publication Year :
1992

Abstract

Provides information on a study that examined phase formation in the interfacial reactions of ultrahigh vacuum deposited titanium thin films on (111)silicon by in situ reflected high energy electron diffraction and transmission electron microscopy. Methodology of the study; Results and discussion on the study.

Details

Language :
English
ISSN :
00218979
Volume :
71
Issue :
12
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7633566
Full Text :
https://doi.org/10.1063/1.350441