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Modulated reflectance study of strain in epitaxial GaAs on silicon.

Authors :
Kallergi, M.
Aubel, J.
Sundaram, S.
Source :
Journal of Applied Physics. 11/15/1989, Vol. 66 Issue 10, p4862. 4p.
Publication Year :
1989

Abstract

Deals with a study which examined the nature of the strain in epitaxial layers of gallium arsenide grown by laser-assisted metalorganic chemical vapor deposition on silicon substrate, using the electrolyte electroreflectance technique. Information on heteroepitaxy of gallium arsenide films; Methodology of the study; Results and discussion.

Details

Language :
English
ISSN :
00218979
Volume :
66
Issue :
10
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7636596
Full Text :
https://doi.org/10.1063/1.343804