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Microvoid nucleation at the interface between a thin film and a substrate in fatigue.
- Source :
-
Journal of Applied Physics . 8/1/1991, Vol. 70 Issue 3, p1405. 7p. 4 Diagrams, 4 Graphs. - Publication Year :
- 1991
-
Abstract
- Presents a study that employed a dislocation dipole model to stimulate the nucleation of microvoids at the interface between a thin film and a substrate. Formulation; Results and discussion; Conclusion.
- Subjects :
- *NUCLEATION
*THIN films
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 70
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7641737
- Full Text :
- https://doi.org/10.1063/1.349549