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Deep-level transient spectroscopy: Increased accuracy of interpretation of silicon/silicon dioxide interface state data by the assistance of computer simulations.

Authors :
Ricksand, Anders
Engström, Olof
Source :
Journal of Applied Physics. 12/1/1991, Vol. 70 Issue 11, p6915. 12p. 2 Diagrams, 11 Graphs.
Publication Year :
1991

Abstract

Studies accuracy of interpretation of silicon/silicon dioxide interface state data by the assistance of computer simulations of deep-level transient spectroscopy. Method of the study; Results and discussion; Conclusion.

Details

Language :
English
ISSN :
00218979
Volume :
70
Issue :
11
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7644398
Full Text :
https://doi.org/10.1063/1.349817