Effects of high-flux low-energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra-high-vacuum reactive magnetron sputtering.

MLA

Adibi, F., et al. “Effects of High-Flux Low-Energy (20–100 EV) Ion Irradiation during Deposition on the Microstructure and Preferred Orientation of Ti0.5Al0.5N Alloys Grown by Ultra-High-Vacuum Reactive Magnetron Sputtering.” Journal of Applied Physics, vol. 73, no. 12, June 1993, p. 8580. EBSCOhost, https://doi.org/10.1063/1.353388.

APA

Adibi, F., Petrov, I., Greene, J. E., Hultman, L., & Sundgren, J.-E. (1993). Effects of high-flux low-energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra-high-vacuum reactive magnetron sputtering. Journal of Applied Physics, 73(12), 8580. https://doi.org/10.1063/1.353388

Chicago

Adibi, F., I. Petrov, J. E. Greene, L. Hultman, and J.-E. Sundgren. 1993. “Effects of High-Flux Low-Energy (20–100 EV) Ion Irradiation during Deposition on the Microstructure and Preferred Orientation of Ti0.5Al0.5N Alloys Grown by Ultra-High-Vacuum Reactive Magnetron Sputtering.” Journal of Applied Physics 73 (12): 8580. doi:10.1063/1.353388.