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An all refractory NbN Josephson junction medium scale integrated circuit process.
- Source :
-
Journal of Applied Physics . 11/1/1990, Vol. 68 Issue 9, p4853. 8p. 7 Black and White Photographs, 2 Diagrams, 4 Charts, 3 Graphs. - Publication Year :
- 1990
-
Abstract
- Discusses the fabrication and electrical performance of an all refractory niobium-nitrogen medium scale integrated circuit process. Fabrication of Josephson junctions; Plasma etching of in situ radio frequency sputter deposited trilayers of niobium-nitrogen/magnesium-oxygen/niobium-nitrogen; Use of a deposited silicon dioxide film for wiring and resistor insulation.
- Subjects :
- *NITROGEN
*INTEGRATED circuits
*NIOBIUM compounds
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 68
- Issue :
- 9
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7655096
- Full Text :
- https://doi.org/10.1063/1.346145