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Refractory metal silicides synthesized by metal vapor vacuum arc ion source implantation.
- Source :
-
Journal of Applied Physics . 4/15/1995, Vol. 77 Issue 8, p3690. 7p. 3 Charts, 7 Graphs. - Publication Year :
- 1995
-
Abstract
- Provides information on a study that synthesized refractory metal silicides by using a metal vapor vacuum arc ion source to implant the respective metal ions with high current density silicon and silicon wafers. Methodology of the study; Results and discussion on the study; Conclusion.
- Subjects :
- *SILICIDES
*VACUUM arcs
*ION implantation
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 77
- Issue :
- 8
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7660682
- Full Text :
- https://doi.org/10.1063/1.359537