IR line width broadening at nearly ideal H-termination region on Si<f>(1 0 0)</f> surfaces

MLA

Wang, Zhi-Hong, et al. “IR Line Width Broadening at Nearly Ideal H-Termination Region on Si(1 0 0) Surfaces.” Surface Science, vol. 502/503, Apr. 2002, p. 86. EBSCOhost, https://doi.org/10.1016/S0039-6028(01)01903-3.

APA

Wang, Z.-H., Noda, H., Nonogaki, Y., Yabumoto, N., & Urisu, T. (2002). IR line width broadening at nearly ideal H-termination region on Si(1 0 0) surfaces. Surface Science, 502/503, 86. https://doi.org/10.1016/S0039-6028(01)01903-3

Chicago

Wang, Zhi-Hong, Hideyuki Noda, Youichi Nonogaki, Norikuni Yabumoto, and Tsuneo Urisu. 2002. “IR Line Width Broadening at Nearly Ideal H-Termination Region on Si(1 0 0) Surfaces.” Surface Science 502/503 (April): 86. doi:10.1016/S0039-6028(01)01903-3.