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Reflection-based near-field ellipsometry for thin film characterization
- Source :
-
Ultramicroscopy . Jan2013, Vol. 124, p26-34. 9p. - Publication Year :
- 2013
-
Abstract
- Abstract: This paper presents a near-field ellipsometry method for nano-scale thin film characterization. The method is based on a reflection configuration of near-field optical detection. In the method, a new set of ellipsometry equations is established by taking into consideration the near-field sample–probe interaction and the topography of the thin film. Experimental and simulation results have shown that the proposed near-field ellipsometry is able to attain precise thin film characterization with nano-scale lateral resolution. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 03043991
- Volume :
- 124
- Database :
- Academic Search Index
- Journal :
- Ultramicroscopy
- Publication Type :
- Academic Journal
- Accession number :
- 83933479
- Full Text :
- https://doi.org/10.1016/j.ultramic.2012.08.003