Cite
Effect of surface roughness on magnetization reversal of Co films on plasma-etched Si(100)...
MLA
Li, M., et al. “Effect of Surface Roughness on Magnetization Reversal of Co Films on Plasma-Etched Si(100)..” Journal of Applied Physics, vol. 83, no. 11, June 1998, p. 6287. EBSCOhost, https://doi.org/10.1063/1.367718.
APA
Li, M., Zhao, Y.-P., Wang, G.-C., & Min, H.-G. (1998). Effect of surface roughness on magnetization reversal of Co films on plasma-etched Si(100).. Journal of Applied Physics, 83(11), 6287. https://doi.org/10.1063/1.367718
Chicago
Li, M., Y.-P. Zhao, G.-C. Wang, and H.-G. Min. 1998. “Effect of Surface Roughness on Magnetization Reversal of Co Films on Plasma-Etched Si(100)..” Journal of Applied Physics 83 (11): 6287. doi:10.1063/1.367718.