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Simple and cost-effective fabrication of size-tunable zinc oxide architectures by multiple size reduction technique.
- Source :
-
Science & Technology of Advanced Materials . 2012, Vol. 13 Issue 2, p1-N.PAG. 9p. - Publication Year :
- 2012
-
Abstract
- We present a simple size reduction technique for fabricating 400 nm zinc oxide (ZnO) architectures using a silicon master containing only microscale architectures. In this approach, the overall fabrication, from the master to the molds and the final ZnO architectures, features cost-effective UV photolithography, instead of electron beam lithography or deep-UV photolithography. A photosensitive Zn-containing sol-gel precursor was used to imprint architectures by direct UV-assisted nanoimprint lithography (UV-NIL). The resulting Zn-containing architectures were then converted to ZnO architectures with reduced feature sizes by thermal annealing at 400 °C for 1 h. The imprinted and annealed ZnO architectures were also used as new masters for the size reduction technique. ZnO pillars of 400 nm diameter were obtained from a silicon master with pillars of 1000 nm diameter by simply repeating the size reduction technique. The photosensitivity and contrast of the Zn-containing precursor were measured as 6.5 J cm-2 and 16.5, respectively. Interesting complex ZnO patterns, with both microscale pillars and nanoscale holes, were demonstrated by the combination of dose-controlled UV exposure and a two-step UV-NIL. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 14686996
- Volume :
- 13
- Issue :
- 2
- Database :
- Academic Search Index
- Journal :
- Science & Technology of Advanced Materials
- Publication Type :
- Academic Journal
- Accession number :
- 88915273
- Full Text :
- https://doi.org/10.1088/1468-6996/13/2/025003