Microstructure and surface properties of chromium-doped diamond-like carbon thin films fabricated by high power pulsed magnetron sputtering.

Abstract: High power pulsed magnetron sputtering (HPPMS) has attracted much interest due to the large plasma density and high ionization rate of sputtered materials. It is expected to produce a highly ionized C flux from a graphite target but unfortunately, the ionization rate of carbon is still very small and the discharge on a solid carbon target is unstable as well. In this work, a stable discharged chromium target is used in the preparation of chromium-doped diamond-like carbon (Cr-DLC) films in HPPMS in reactive C2H2 gas, but the unstable graphite. The chromium concentration in the Cr-DLC films is limited by surface poisoning due to reactive gas. Less than 2% of Cr is incorporated into the DLC films at C2H2 flow rate of 5sccm or higher. However, as a result of the high ionization rate of the reactive gas in HPPMS, intense ion bombardment of the substrate is realized. The films show a smooth surface and a dense structure with a large sp3 concentration. As the C2H2 flow increase, the sp3 fraction increase and the sp3 to sp2 ratio increase to 0.75at a C2H2 flow rate of 10sccm. Compared to the substrate, the Cr-DLC films have lower friction and exhibit excellent corrosion resistance. [Copyright &y& Elsevier]