Inverted fractal analysis of TiO x thin layers grown by inverse pulsed laser deposition.

Highlights: [•] A method for determining fractal dimension of cauliflower-like layers is presented. [•] An objective thresholding routine for SEM micrographs is introduced. [•] A fractal dimension of 1.83 for TiO x films grown at 5–50Pa pressures was found. [•] The fractal structure of inverse pulsed laser deposited TiO x films was confirmed. [•] The obtained fractal dimension suggests that aggregation of plasma species has only limited contribution to the deposition. [Copyright &y& Elsevier]