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Influence of oxygen pressure and substrate temperature on the properties of aluminum fluoride thin films.
- Source :
-
Applied Surface Science . Oct2013, Vol. 282, p226-230. 5p. - Publication Year :
- 2013
-
Abstract
- Highlights: [•] Influence of oxygen pressure and temperature on AlF3 films was characterized. [•] Alumina was detected and the formation mechanism was analyzed. [•] Samples prepared with oxygen contain more alumina, and the mechanical stress was reduced. [•] By introducing oxygen, extinctive coefficient was reduced and the refractive index was increased. [•] Samples prepared with certain oxygen pressure tend to be more laser resistant. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 01694332
- Volume :
- 282
- Database :
- Academic Search Index
- Journal :
- Applied Surface Science
- Publication Type :
- Academic Journal
- Accession number :
- 89508743
- Full Text :
- https://doi.org/10.1016/j.apsusc.2013.05.108