Mass-spectrometric and kinetic study of Ni films MOCVD from bis-(ethylcyclopentadienyl) nickel.

The physicochemical regularities of chemical vapor deposition (CVD) of nickel films from bis-(ethylcyclopentadienyl) nickel [(EtCp)2 Ni] have been experimentally studied for two reaction systems: (EtCp)2 Ni–H2–Ar and (EtCp)2 Ni–Ar. A model reaction scheme of (EtCp)2 Ni transformations has been developed in accordance with the data from the time-of-flight mass-spectrometry of the reaction gas phase. The results from a study of process kinetics and morphology of the deposited layers show that the growth process is controlled by nucleation step in the deposition temperature range 760–840K in case of (EtCp)2 Ni pyrolysis and within the interval 640–810K when hydrogen is added (at P[(EtCp)2 Ni]=75Pa). The values of activation energy of the processes are 189±9 and 115±6kJ·mol−1 for the temperature ranges mentioned, respectively. [ABSTRACT FROM AUTHOR]