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High-resolution X-ray diffraction analysis of the Bragg peak integrated intensity in highly mismatched III-N epilayers
- Source :
-
Journal of Crystal Growth . Apr2003, Vol. 250 Issue 3/4, p354. 5p. - Publication Year :
- 2003
-
Abstract
- A new method of measuring the thickness of GaN epilayers on sapphire (0 0 0 1) substrates by using double crystal X-ray diffraction was proposed. The ratio of the integrated intensity between the GaN epilayer and the sapphire substrate showed a linear relationship with the GaN epilayer thickness up to 2.12 μm. It is practical and convenient to measure the GaN epilayer thickness using this ratio, and can mostly eliminate the effect of the reabsorption, the extinction and other scattering factors of the GaN epilayers. [Copyright &y& Elsevier]
- Subjects :
- *EPITAXY
*X-ray diffraction
Subjects
Details
- Language :
- English
- ISSN :
- 00220248
- Volume :
- 250
- Issue :
- 3/4
- Database :
- Academic Search Index
- Journal :
- Journal of Crystal Growth
- Publication Type :
- Academic Journal
- Accession number :
- 9144569
- Full Text :
- https://doi.org/10.1016/S0022-0248(02)02477-6