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Polytypic InP Nanolaser Monolithically Integratedon (001) Silicon.

Authors :
Wang, Zhechao
Tian, Bin
Paladugu, Mohanchand
Pantouvaki, Marianna
Le Thomas, Nicolas
Merckling, Clement
Guo, Weiming
Dekoster, Johan
Van Campenhout, Joris
Absil, Philippe
Van Thourhout, Dries
Source :
Nano Letters. Nov2013, Vol. 13 Issue 11, p5063-5069. 7p.
Publication Year :
2013

Abstract

On-chip optical interconnects stillmiss a high-performance lasermonolithically integrated on silicon. Here, we demonstrate a silicon-integratedInP nanolaser that operates at room temperature with a low thresholdof 1.69 pJ and a large spontaneous emission factor of 0.04. An epitaxialscheme to grow relatively thick InP nanowires on (001) silicon isdeveloped. The zincblende/wurtzite crystal phase polytypism and theformed type II heterostructures are found to promote lasing over awide wavelength range. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
15306984
Volume :
13
Issue :
11
Database :
Academic Search Index
Journal :
Nano Letters
Publication Type :
Academic Journal
Accession number :
91967300
Full Text :
https://doi.org/10.1021/nl402145r