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Abrasive and additive interactions in high selectivity STI CMP slurries.

Authors :
Praveen, B.V.S.
Manivannan, R.
Umashankar, T.D.
Cho, Byoung-Jun
Park, Jin-Goo
Ramanathan, S.
Source :
Microelectronic Engineering. Feb2014, Vol. 114, p98-104. 7p.
Publication Year :
2014

Abstract

Highlights: [•] Silicon dioxide to silicon nitride removal rate selectivity evaluated. [•] Ceria purity and crystal structure influence selectivity. [•] l-glutamic acid yields high selectivity with all ceria and is robust. [•] l-proline yields high selectivity only with one ceria and is less robust. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
01679317
Volume :
114
Database :
Academic Search Index
Journal :
Microelectronic Engineering
Publication Type :
Academic Journal
Accession number :
92650677
Full Text :
https://doi.org/10.1016/j.mee.2013.10.004