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InAs/InGaAsN quantum dots emitting at 1.55 μm grown by molecular beam epitaxy
- Source :
-
Journal of Crystal Growth . Apr2003, Vol. 251 Issue 1-4, p388. 4p. - Publication Year :
- 2003
-
Abstract
- InAs/InGaAsN quantum dots have been grown by molecular beam epitaxy on GaAs substrates. Transmission electron microscopy shows the increase in the island size as compared to the InAs/InGaAs quantum dots. Room temperature photoluminescence at 1.55 μm has been demonstrated whose intensity was comparable to that of the InGaAsN/GaAs quantum wells emitting at 1.3 μm. The effect of nitrogen concentration on the PL peak position and intensity has been studied. [Copyright &y& Elsevier]
- Subjects :
- *QUANTUM dots
*MOLECULAR beam epitaxy
*SEMICONDUCTORS
Subjects
Details
- Language :
- English
- ISSN :
- 00220248
- Volume :
- 251
- Issue :
- 1-4
- Database :
- Academic Search Index
- Journal :
- Journal of Crystal Growth
- Publication Type :
- Academic Journal
- Accession number :
- 9441074
- Full Text :
- https://doi.org/10.1016/S0022-0248(02)02432-6