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Vertically Aligned Peptide Nanostructures Using Plasma-EnhancedChemical Vapor Deposition.

Authors :
Vasudev, Milana C.
Koerner, Hilmar
Singh, Kristi M.
Partlow, Benjamin P.
Kaplan, David L.
Gazit, Ehud
Bunning, Timothy J.
Naik, Rajesh R.
Source :
Biomacromolecules. Feb2014, Vol. 15 Issue 2, p533-540. 8p.
Publication Year :
2014

Abstract

In this study, we utilize plasma-enhancedchemical vapor deposition(PECVD) for the deposition of nanostructures composed of diphenylalanine.PECVD is a solvent-free approach and allows sublimation of the peptideto form dense, uniform arrays of peptide nanostructures on a varietyof substrates. The PECVD deposited d-diphenylalanine nanostructureshave a range of chemical and physical properties depending on thespecific discharge parameters used during the deposition process. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
15257797
Volume :
15
Issue :
2
Database :
Academic Search Index
Journal :
Biomacromolecules
Publication Type :
Academic Journal
Accession number :
94429988
Full Text :
https://doi.org/10.1021/bm401491k