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Effect of temperature on advanced Si-based substrates performance for RF passive integration.

Authors :
Roda Neve, C.
Ben Ali, K.
Sarafis, P.
Hourdakis, E.
Nassiopoulou, A.G.
Raskin, J.-P.
Source :
Microelectronic Engineering. May2014, Vol. 120, p205-209. 5p.
Publication Year :
2014

Abstract

Highlights: [•] PSi and TR HR-Si substrates provide HR properties (>3kΩ-cm) for RF applications. [•] The resistivity of trap-rich HR-Si and PSi decrease with temperature increase. [•] Permittivity of PSi is almost 4 times lower than TR HR-Si. [•] The non-linear properties of PSi and TR HR-Si increase with temperature. [•] At high temperature (175°C) PSi behaves better than TR HR-Si. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
01679317
Volume :
120
Database :
Academic Search Index
Journal :
Microelectronic Engineering
Publication Type :
Academic Journal
Accession number :
95502696
Full Text :
https://doi.org/10.1016/j.mee.2013.08.004