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Total dose radiation effects of hybrid bulk/SOI CMOS active pixel with buried channel SOI source follower.

Authors :
Yang, Xiao-liang
Wang, Ying
Du, Bin
Yu, Cheng-hao
Source :
Microelectronics Journal. Apr2014, Vol. 45 Issue 4, p477-481. 5p.
Publication Year :
2014

Abstract

Abstract: A CMOS active pixel with pinned photodiode which used in-pixel buried-channel (BC) transistor has been reported, and the characteristic of CMOS image sensor with in-pixel buried-channel transistor was carried out. In this paper, we have a research on a hybrid bulk/silicon-on-insulator (SOI) CMOS active pixel with pinned photodiode which use buried channel SOI NMOS Source Flower (SF) by simulation. We study the basic characteristics of buried-channel SOI NMOS and the characteristics of CMOS active pixel optimized by using in-pixel buried-channel SOI transistor under radiation. The results show that, compared to the conventional active pixel with the standard surface-channel (SC) SOI NMOS SF, the dark random noise of the pixel which uses in-pixel buried channel SOI NMOS SF can be reduced under the radiation and the output swing is improved. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00262692
Volume :
45
Issue :
4
Database :
Academic Search Index
Journal :
Microelectronics Journal
Publication Type :
Academic Journal
Accession number :
95929260
Full Text :
https://doi.org/10.1016/j.mejo.2014.02.021