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Microstitching interferometry for x-ray reflective optics.
- Source :
-
Review of Scientific Instruments . May2003, Vol. 74 Issue 5, p2894. 5p. - Publication Year :
- 2003
-
Abstract
- A new stitching interferometry based on a microscopic interferometer having peak-to-valley height accuracy of subnanometer order and lateral resolution higher than 20 μm was developed to measure surface figures of large-size x-ray mirror optics. Cumulative errors of the stitching angle in a long spatial wavelength range were effectively reduced to be 1×10[sup -7] rad levels using another interferometer having a large cross section in the optical cavity. Some optical performances of ultraprecise x-ray mirrors, such as submicrofocused beam profile, were wave optically calculated from the measured surface figure profiles and observed at the 1 km long beamline (BL29XUL) of SPring-8. Observed and wave optically calculated results were in good agreement with a high degree of accuracy. © 2003 American Institute of Physics. [ABSTRACT FROM AUTHOR]
- Subjects :
- *INTERFEROMETRY
*OPTICAL instruments
*MIRRORS
*OPTICS
Subjects
Details
- Language :
- English
- ISSN :
- 00346748
- Volume :
- 74
- Issue :
- 5
- Database :
- Academic Search Index
- Journal :
- Review of Scientific Instruments
- Publication Type :
- Academic Journal
- Accession number :
- 9630267
- Full Text :
- https://doi.org/10.1063/1.1569405