Reduction of metal contact resistance of graphene devices via CO2 cluster cleaning.

MLA

Sarang Gahng, et al. “Reduction of Metal Contact Resistance of Graphene Devices via CO2 Cluster Cleaning.” Applied Physics Letters, vol. 104, no. 22, June 2014, pp. 1–4. EBSCOhost, https://doi.org/10.1063/1.4881635.

APA

Sarang Gahng, Chang Ho Ra, Yu Jin Cho, Jang Ah Kim, Taesung Kim, & Won Jong Yoo. (2014). Reduction of metal contact resistance of graphene devices via CO2 cluster cleaning. Applied Physics Letters, 104(22), 1–4. https://doi.org/10.1063/1.4881635

Chicago

Sarang Gahng, Chang Ho Ra, Yu Jin Cho, Jang Ah Kim, Taesung Kim, and Won Jong Yoo. 2014. “Reduction of Metal Contact Resistance of Graphene Devices via CO2 Cluster Cleaning.” Applied Physics Letters 104 (22): 1–4. doi:10.1063/1.4881635.