Back to Search Start Over

Predicting CMOS speed with gate oxide and voltage scaling...

Authors :
Chen, Kai
Hu, Chenming
Source :
IEEE Transactions on Electron Devices. Nov97, Vol. 44 Issue 11, p1951. 7p. 1 Chart, 12 Graphs.
Publication Year :
1997

Abstract

Studies the sub-quarter micron metal-oxide semiconductor field effect transistors (MOSFET's) and ring oscillators at supply voltage that can be predicted from a universal mobility model. Discussion of the development of analytical equations of electron and hole mobility; Prediction and interconnect loading effect; Conclusions.

Details

Language :
English
ISSN :
00189383
Volume :
44
Issue :
11
Database :
Academic Search Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
9711033656
Full Text :
https://doi.org/10.1109/16.641365