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Metalorganic chemical vapor deposition of [100] textured MgO thin films.
- Source :
-
Applied Physics Letters . 6/19/1989, Vol. 54 Issue 25, p2542. 3p. - Publication Year :
- 1989
-
Abstract
- We report on the results of a recent study on the deposition of [100] textured MgO films on fused quartz substrates by using the metalorganic chemical vapor deposition technique. Magnesium β-diketonate was used as the metal source and the growth rate of the film was about 0.4 μm/h at 740 °C in a horizontal warm wall reactor. X-ray diffraction experiments provided evidence that the MgO films on fused quartz were fully textured with [100] orientation perpendicular to the substrate surface. The films had a very smooth surface morphology and optical transparency with an index of refraction of 1.71. [ABSTRACT FROM AUTHOR]
- Subjects :
- *MAGNESIUM oxide
*FUSED silica
*CHEMICAL vapor deposition
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 54
- Issue :
- 25
- Database :
- Academic Search Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 9831688
- Full Text :
- https://doi.org/10.1063/1.101044