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Preparation of ferroelectric BaTiO3 thin films by activated reactive evaporation.

Authors :
Iijima, K.
Terashima, T.
Yamamoto, K.
Hirata, K.
Bando, Y.
Source :
Applied Physics Letters. 2/5/1990, Vol. 56 Issue 6, p527. 3p.
Publication Year :
1990

Abstract

Ferroelectric BaTiO3 thin films were directly and epitaxially grown on SrTiO3 single crystal and epitaxial Pt film substrates by activated reactive evaporation. The substrate temperature was around 600 °C. For (100) oriented as-grown films, a typical ferroelectric hysteresis loop and a maximum of dielectric constant at about 115 °C were observed. The resistivity was as high as 109 Ω cm and the breakdown voltage was 2.7 MV/cm for as-grown BaTiO3 films. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
56
Issue :
6
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
9833609
Full Text :
https://doi.org/10.1063/1.103300