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Method of choice for fabrication of high-quality ZnO-based Schottky diodes.

Authors :
Müller, Stefan
Von Wenckstern, Holger
Schmidt, Florian
Splith, Daniel
Heinhold, Robert
Allen, Martin
Grundmann, Marius
Source :
Journal of Applied Physics. 2014, Vol. 116 Issue 19, p194506-1-194506-12. 12p. 1 Diagram, 2 Charts, 6 Graphs.
Publication Year :
2014

Abstract

We present a comprehensive comparison of electrical properties of differently fabricated high quality Schottky contacts on ZnO thin films grown by pulsed laser deposition. Thermally evaporated Pd/ZnO Schottky contacts exhibit ideality factors as low as 1.06 due to their high lateral homogeneity. The effective Richardson constant determined using these homogeneous contacts is (7.7±4.8)Acm-2 K-2 close to the theoretical value of 32Acm-2 K-2. However, their rectification ratio is at most five orders of magnitude due to their comparably small barrier height (≈0:7eV). The largest effective barrier height (1:11 eV) and rectification ratio (7 × 1010) was obtained for reactively sputtered PdOx/ZnO Schottky contacts. Eclipse pulsed laser deposited IrOx/ZnO Schottky contacts were found to combine very good lateral homogeneity (n ≈ 1:1), with a reasonably large barrier height (0:96 eV) and large rectification ratio (≈9 orders of magnitude). Our results for differently fabricated Schottky contacts suggest that the barrier formation is highly dependent on the presence of oxygen vacancies close to the interface and the different compensation mechanisms involved. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
116
Issue :
19
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
99621976
Full Text :
https://doi.org/10.1063/1.4901637