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Photoluminescence Study of Low Thermal Budget III-V Nanostructures on Silicon by Droplet Epitaxy.

Authors :
Bietti S
Somaschini C
Sarti E
Koguchi N
Sanguinetti S
Isella G
Chrastina D
Fedorov A
Source :
Nanoscale research letters [Nanoscale Res Lett] 2010 Jul 18; Vol. 5 (10), pp. 1650-3. Date of Electronic Publication: 2010 Jul 18.
Publication Year :
2010

Abstract

We present of a detailed photoluminescence characterization of high efficiency GaAs/AlGaAs quantum nanostructures grown on silicon substrates. The whole process of formation of the GaAs/AlGaAs active layer was realized via droplet epitaxy and migration enhanced epitaxy maintaining the growth temperature ≤350°C, thus resulting in a low thermal budget procedure compatible with back-end integration of the fabricated materials on integrated circuits.

Details

Language :
English
ISSN :
1931-7573
Volume :
5
Issue :
10
Database :
MEDLINE
Journal :
Nanoscale research letters
Publication Type :
Academic Journal
Accession number :
21076665
Full Text :
https://doi.org/10.1007/s11671-010-9689-8