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Hierarchical nanostructures by sequential self-assembly of styrene-dimethylsiloxane block copolymers of different periods.

Authors :
Son JG
Hannon AF
Gotrik KW
Alexander-Katz A
Ross CA
Source :
Advanced materials (Deerfield Beach, Fla.) [Adv Mater] 2011 Feb 01; Vol. 23 (5), pp. 634-9. Date of Electronic Publication: 2010 Dec 06.
Publication Year :
2011

Abstract

Poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) block copolymers with a period as low as 13 nm have been self-assembled on a template formed from PS-b-PDMS of a 34–40 nm period, which is itself templated by micron-scale substrate features prepared using conventional lithography. This hierarchical process provides a simple method for directing the self-assembly of sub-10 nm features and registering them on the substrate.

Details

Language :
English
ISSN :
1521-4095
Volume :
23
Issue :
5
Database :
MEDLINE
Journal :
Advanced materials (Deerfield Beach, Fla.)
Publication Type :
Academic Journal
Accession number :
21274911
Full Text :
https://doi.org/10.1002/adma.201002999