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Contact area lithography and pattern transfer of self-assembled organic monolayers on SiO2/Si substrates.

Authors :
Bae C
Kim H
Shin H
Source :
Chemical communications (Cambridge, England) [Chem Commun (Camb)] 2011 May 14; Vol. 47 (18), pp. 5145-7. Date of Electronic Publication: 2011 Mar 21.
Publication Year :
2011

Abstract

We describe a procedure for one-step patterning and transfer of self-assembled organic monolayers (SAMs) on SiO(2)/Si substrates. This procedure was inspired from an idea of pattern formation at contact area, which realizes high patterning fidelity, and enables a universal approach for the micro/nanometre scale patterning of SAMs.<br /> (© The Royal Society of Chemistry 2011)

Details

Language :
English
ISSN :
1364-548X
Volume :
47
Issue :
18
Database :
MEDLINE
Journal :
Chemical communications (Cambridge, England)
Publication Type :
Academic Journal
Accession number :
21423991
Full Text :
https://doi.org/10.1039/c1cc10283d