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Morphology control in block copolymer films using mixed solvent vapors.

Authors :
Gotrik KW
Hannon AF
Son JG
Keller B
Alexander-Katz A
Ross CA
Source :
ACS nano [ACS Nano] 2012 Sep 25; Vol. 6 (9), pp. 8052-9. Date of Electronic Publication: 2012 Aug 31.
Publication Year :
2012

Abstract

Solvent vapor annealing of block copolymer thin films can produce a range of morphologies different from the equilibrium bulk morphology. By systematically varying the flow rate of two different solvent vapors (toluene and n-heptane) and an inert gas, phase maps showing the morphology versus vapor pressure of the solvents were constructed for 45 kg/mol polystyrene-block-polydimethylsiloxane diblock copolymer films of different thicknesses. The final morphology was correlated with the swelling of the block copolymer and homopolymer films and the solvent vapor annealing conditions. Self-consistent field theory is used to model the effects of solvent swelling. These results provide a framework for predicting the range of morphologies available under different solvent vapor conditions, which is important in lithographic applications where precise control of morphology and critical dimensions are essential.

Details

Language :
English
ISSN :
1936-086X
Volume :
6
Issue :
9
Database :
MEDLINE
Journal :
ACS nano
Publication Type :
Academic Journal
Accession number :
22928726
Full Text :
https://doi.org/10.1021/nn302641z